Two-state dynamics achieved on amorphous silicon surface
نویسندگان
چکیده
منابع مشابه
Direct imaging of two-state dynamics on the amorphous silicon surface.
Amorphous silicon is an important material, amidst a debate whether or not it is a glass. We produce amorphous Si surfaces by ion bombardment and vapor growth, and image discrete Si clusters which hop by two-state dynamics at 295 K. Independent of surface preparation, these clusters have an average diameter of ∼5 atoms. Given prior results for metallic glasses, we suggest that this cluster size...
متن کاملSolution-processed amorphous silicon surface passivation layers
Amorphous silicon thin films, fabricated by thermal conversion of neopentasilane, were used to passivate crystalline silicon surfaces. The conversion is investigated using X-ray and constant-final-state-yield photoelectron spectroscopy, and minority charge carrier lifetime spectroscopy. Liquid processed amorphous silicon exhibits high Urbach energies from 90 to 120 meV and 200 meV lower optical...
متن کاملTwo-phase electrochemical lithiation in amorphous silicon.
Lithium-ion batteries have revolutionized portable electronics and will be a key to electrifying transport vehicles and delivering renewable electricity. Amorphous silicon (a-Si) is being intensively studied as a high-capacity anode material for next-generation lithium-ion batteries. Its lithiation has been widely thought to occur through a single-phase mechanism with gentle Li profiles, thus o...
متن کاملSurface roughening during plasma enhanced chemical vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates
Surface roughening during plasma enhanced chemical vapor deposition of hydrogenated amorphous silicon on crystal silicon substrates" Physical Review B. The morphology of a series of thin films of hydrogenated amorphous silicon ͑a-Si:H͒ grown by plasma-enhanced chemical-vapor deposition ͑PECVD͒ is studied using scanning tunneling microscopy. The substrates were atomically flat, oxide-free, single-cr...
متن کاملImproved silicon surface passivation achieved by negatively charged silicon nitride films
A corona discharge is used to create and store negative charge in the silicon nitride films of silicon dioxide/silicon nitride stacks. Effective lifetime measurements on both textured and planar, as well as both boron diffused and undiffused silicon samples passivated with silicon oxide/silicon nitride stacks, show that the creation of negative charge in the nitride layer results in an improvem...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: MRS Bulletin
سال: 2011
ISSN: 0883-7694,1938-1425
DOI: 10.1557/mrs.2011.221